MICROELECTRONIC TECHNOLOGY FOR COMPUTER OPTICS

V. V. Aristov, S. V. Babin, A. I. Erko

Abstract:
The lithographic techniques of microelectronics are examined for their adaptability in the production of high-resolution diffraction optical components. Methods suitable for the preparations of optical topology are described. The major emphasis is placed on the application of electron beam lithography to computer optics problems. The operations of microstructural profiling are illustrated by diffraction elements prepared under a soft X-ray technology.

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