Управление вкладом компонент векторного электрического поля в фокусе высокоапретурной линзы с помощью бинарных фазовых структур
Хонина С.Н., Волотовский С.Г.
Аннотация:
Показана возможность управления вкладом компонент векторного электрического поля в фокальной области с помощью бинарных фазовых структур с целью уменьшения поперечного размера центрального светового пятна фокусирующей системы с высокой числовой апертурой. На основе анализа матрицы поляризационного преобразования высокоапертурной линзы и численного моделирования фокусирующей системы в приближении Дебая показана эффективность использования полноапертурных асимметричных бинарных распределений для формирования субволнового центрального пятна площадью по полуспаду интенсивности 0,08 лямбда в квадрате с эффективностью 3,6% для линейной поляризации, 0,084 лямбда в квадрате с эффективностью 13% для радиальной поляризации и 0,054 лямбда в квадрате с эффективностью 2,4% для азимутальной поляризации.
Abstract:
Possibility of control by the contribution of components of vector electric field in focal area by means of binary phase structures for the purpose of reduction of the cross-section size of the central light spot of focusing system with the high numerical aperture is shown. By analysis of a matrix of polarizing transformation of a high-aperture lens and numerical modeling of focusing system in Debay approach efficiency of use full-aperture asymmetric binary distributions for formation of a subwavelength central spot is shown: half-maximum-area (HMA) 0.08 lambda ^2 with efficiency of 3.6% for linearly polarized beam, 0.084 lambda ^2 with efficiency of 13% for radially polarized beam and 0.054 lambda ^2 with efficiency of 2.4% for azimuthally polarized beam.
Ключевые слова: острая фокусировка, размер фокального пятна, бинарный фазовый дифракционный оптический элемент.
Key words:sharp focusing, size of a focal spot, binary phase diffractive optical element.
Литература:
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