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Formation and investigation of diffraction microrelief fabricated on the end face of halogenide IR waveguide

S.A. Borodin 1, A.V. Volkov 1, 2, N.L. Kazanskiy 1, 2, S.V.Karpeev  1, 2, O.Y. Moiseev 1, 2

V.S. Pavelyev 1, 2, D.M. Yakunenkova 1, Y.A. Runkov 1, D.L.Golovashkin 1,
1Samara State Aerospace University(SSAU)
2Image Processing Systems Institute of RAS

 PDF, 124 kB

Pages: 45-49.

Full text of article: Russian language.

Abstract:
The article considers the formation of diffraction microrelief on the end face of halogenide IR waveguide in order to control the radiation emerging from the waveguide. The results of the first experiments on the formation and investigation of a binary diffraction grating at the waveguide end face using the hot stamping technology are presented.

Keywords:
diffraction microrelief, halogenide IR waveguide, binary diffraction grating, waveguide, hot stamping technology.

Citation:
BorodinSA, VolkovAV, KazanskiyNL, KarpeevSV, MoiseevOY, PavelyevVS, YakunenkovaDM, RunkovYA, GolovashkinDL. Formation and investigation of diffraction microrelief fabricated on the end faceof halogenide IR waveguide. Computer Optics 2005; 27: 45-49.

Acknowledgements:
This work was supported by a grant from the President of the Russian Federation НШ-1007.2003.1, as well as the Russian-American program “Basic Research and Higher Education” (“BRHE”) and grants from the Russian Foundation for Basic Research 04-02-08094 and 05-01-96505.

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