Control by contribution of components of vector electric field in focus of a high-aperture lens by means of binary phase structures
S.N. Khonina, S.G. Volotovsky

Image Processing Systems Institute of the RAS,
Samara State Aerospace University

Full text of article: Russian language.

Abstract:
Possibility of control by the contribution of components of vector electric field in focal area by means of binary phase structures for the purpose of reduction of the cross-section size of the central light spot of focusing system with the high numerical aperture is shown. By analysis of a matrix of polarizing transformation of a high-aperture lens and numerical modeling of focusing system in Debay approach efficiency of use full-aperture asymmetric binary distributions for formation of a subwavelength central spot is shown: half-maximum-area (HMA) 0.08 lambda ^2 with efficiency of 3.6% for linearly polarized beam, 0.084 lambda ^2 with efficiency of 13% for radially polarized beam and 0.054 lambda ^2 with efficiency of 2.4% for azimuthally polarized beam.

Key words:sharp focusing, size of a focal spot, binary phase diffractive optical element.

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