Full text of article: Russian language.

Abstract:
The possibilities of correction of monochromatic aberrations of high aperture confocal diffractive objectives are investigated. Potential possibilities of these objectives for deep ultra-violet lithography are compared to possibilities of refractive objectives. It is shown, that comparable characteristics at diffractive objectives are reached at essentially smaller quantity of lenses.

Key words:
diffractive lens, refractive lens, paraxial design, correction of aberrations, confocal objective, telecetntric ray tracing, deep ultra-violet lithography.

References:

1. Computational Optics. Handbook / by ed. M.M. Rusinov – Leningrad.: Mashinostroenie, 1984. – 423 p. (in Russian)
2. Ulrich W. Trends in Optical Design of Projection Lens for UV and EUV Lithography / W. Ulrich, S. Beiersdoerfer, H.J. Mann // Proc. SPIE. – 2000. – V. 4146. – Р. 13–24.
3. Pat. US6801364B2 Projection objective for microlithography / Karl-Heinz Schuster; Assignee: Carl Zeiss SMT AG, Oberkochen, DE; date of patent 05.10.2004.
4. Pat. US7154677B2 Projection objective for microlithography / Karl-Heinz Schuster; Assignee: Carl Zeiss Stiftung, Brenz, DE; date of patent 26.12.2006.
5. Bruning, J.H. Optical lithography: 40 years and holding / J.H. Bruning // Proc. SPIE. 2007. V. 6520. P. 652004-1-652004-13.
6. Bobrov, S.T. Monochromatic Aberrations of Two-component Optical System / S.T. Bobrov, G.I. Greisukh, // Optika i Spektroskopiya. – 1980. – V. 49, N. 4. – P. 809-813 (in Russian)
7. Greisukh, G.I. Correction of the third order monochromatic aberrations of the two-lens diffractive objective / G.I. Greisukh, // Optika i Spektroskopiya. – 1980. – V. 49, N. 6. – P. 1212-1215 (1980) (in Russian)
8. Bobrov, S.T. Optics of diffractive elements and systems / S.T. Bobrov, G.I. Greisukh, Yu.G. Turkevich. – Leningrad, Mashinostroenie, 1986. – 223 p. – (in Russian).
9. Greisukh, G.I. Optics of diffractive and gradient-index elements and systems / G.I. Greisukh, S.T. Bobrov, S.A. Stepanov – Bellingham: SPIE Press, 1997. – 414 p.
10. Herzberger, M. Modern geometrical optics / M. Herzberger – New York - London, Interscience Publishers, Inc., 1958.
11. Gerard, A. Introduction to Matrix Methods in Optic / A. Gerard, J.M. Burch – New York, Wiley, 1975. – 340 p.
12. Greisukh, G.I. Optics of Gradient-Index and Diffractive Elements / G.I. Greisukh, I.M. Efimenko, and S.A. Stepanov – Moscow.: Radio i svjaz, 1990. – (in Russian)
13. ZEMAX: software for optical system design [Electronic resource]. – Access mode: http://www.zemax.com
14. Belsky A.B. Prospects for the development of optical systems for nanolithography / A.B. Belsky, M.A. Gan, I.A. Mironov, and R.P. Seysyan // Journal of Optical Technology – 2009. – V. 76, N. 8. – P. 59-69.
15. Born, M. Principles of Optics, 5th ed / M. Born, E. Wolf – N.Y.: Pergamon Press, 1964.
16. Ezhov, E.G. Pseudo-ray tracing through the diffraction structures on the spherical surfaces / E.G. Ezhov, S.A. Stepanov // Computer Optics. - 2000. - Iss. 20. - P. 25-28. - (in Russian).
17. Excimer Laser Technology / by ed. D. Basting and G. Marowsky. – Berlin: Springer, 2005. – 433 p.
18. NovaLine Lithography Lasers and EUV Sources [Electronic resource]. – Access mode: http://www.artisan-scientific.com/info/Lambda_K2000_Datasheet.pdf .

---

© 2009, IPSI RAS
Institution of Russian Academy of Sciences, Image Processing Systems Institute of RAS, Russia, 443001, Samara, Molodogvardeyskaya Street 151; E-mail: ko@smr.ru; Phones: +7 (846) 332-56-22, Fax: +7 (846) 332-56-20