Precision laser recording on a molybdenum films for diffractive microrelief formation
A.V. Volkov, O.Yu. Moiseev, S.D. Poletaev

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Full text of article: Russian language.

DOI: 10.18287/0134-2452-2013-37-2-220-225

Pages: 220-225.

Abstract:
The problem of reducing the thickness of the lines of contact pattern masks used in the formation of micro-relief of diffractive optical elements (DOEs) and produced by laser ablation of thin films of refractory metals. For contact mask of DOEs on molybdenum films with thickness of 40 nm using a laser ablation patterns recorded with elements of the picture width 0.25–0.3 µm. This is approximately 3 times smaller than the characteristic dimensions, obtained by thermochemical recording chromium films of the same thickness in the standard process. Reactive ion etching in an inductively coupled plasma through a mask was formed micro-relief height up to 300 nm in a quartz substrate. We have shown promising applications of thin films of molybdenum as a metallic mask in the formation of microrelief of DOEs.

Key words:
diffractive microrelief, metallic mask, laser ablation, thermochemical recording, film molybdenum, reactive ion etching.

References:

  1. Veiko, V.P. Study of the spatial resolution of laser thermochemical technology for recording diffraction microstructures / V.P. Veiko, V.I. Korol'kov, A.G. Poleshchuk, A.R. Sa­metov, E.A. Shakhno, M.V. Yarchuk // Quantum Electronics. – 2011. – Vol. 41, N 7. – P. 631-636. – (In Russian).
  2. Veiko, V.P. Researching the features of multibeam laser thermochemical recording of diffractive microstructures / V.P. Veiko, D.A. Sinev, E.A. Shakhno, A.G. Poleshchuk, A.R. Sametov, A.G. Sedukhin // Computer Optics. – 2012. – V. 36, N 4. – P. 562-571. – (In Russian).
  3. Volkov, A.V. The study of plasma etching technology for creation of multi-level diffractive optical elements / A.V. Volkov, N.L. Kazanskiy, O.Ye. Rybakov // Computer Optics. – 1998. – N 18. – P. 127-130. – (In Russian).
  4. Volkov, A.V. Development of technology for creation of diffractive optical elements with submicron dimensions of the relief in the silicon wafer / A.V. Volkov, N.L. Ka­zanskiy, O.Ye. Rybakov // Computer Optics. – 1998. – N 18. – P. 130-133. – (In Russian).
  5. Poleshchuk, A.G. Polar coordinate laser pattern generator for fabrication of diffractive optical elements with arbitrary structure / A.G. Poleshchuk, E.G. Churin, V.P. Koronkevich, V.P. Korolkov, A.A. Kharissov, V.V. Cherkashin, V.P. Ki­ryanov, A.V. Kiryanov, S.A. Kokarev, A.G. Verhoglyad // Applied Optics. – 1999. – Vol. 38, N 8. – P. 1295-1301.
  6. Kazanskiy, N.L. Anisotropic etching of SiO2 in high-voltage gas-discharge plasmas / N.L. Kazanskiy, V.A. Kol­pakov, and A.I. Kolpakov // Russian Microelectronics. – 2004. – Vol. 33, N 3. – P. 169-182.
  7. Kazanskiy, N.L. A research complex for solving computer optics problems / N.L. Kazanskiy // Computer Optics. – 2006. – N 29. – P. 58-77. – ISSN 0134-2452. – (In Russian).
  8. Pavelyev, V.S. Formation of diffractive microrelief on diamond film surface / V.S. Pavelyev, S.A. Borodin, N.L. Ka­zanskiy, G.F. Kostyuk, A.V. Volkov // Optics & Laser Technology. – 2007. – Vol. 39, N 6. – P. 1234-1238.
  9. Bezus, E.A. Evanescent-wave interferometric nanoscale pho­tolithography using guided-mode resonant gratings / E.A. Bezus, L.L. Doskolovich, N.L. Kazanskiy // Microelectronic Engineering. – 2011. – Vol. 88, N 2. – P. 170-174.
  10. Kazanskiy, N.L. Research and technological center of diffraction optics / N.L. Kazanskiy // Bulletin of Samara Scientific Center of the Russian Academy of Sciences. – 2011. – Vol. 13, N 4-1. – P. 54-62. – (In Russian).
  11. Agafonov, A.N. The analysis of dependence of resolution of technology of local thermochemical oxidation from parameters of structure of a photosensitive film of chrome / A.N. Agafonov, O.Yu. Moiseyev, A.A. Korlyukov // Computer Optics. – 2010. – Vol. 34, N 1. – P. 101-108. – (In Russian).
  12. Jörgens, R. Verfahren und Anordnung zur Erzeugung von Strukturen im Submikrometerbereich / R. Jörgens, A. Gor­bunov, W. Pompe // Patent DE19544295A1 – 05.06.1997. G02B 5/18, 21/00.
  13. Heise, G. Laser ablation of thin molybdenum films on transparent substrates at low fluences / G. Heise, M. Englmaier, C. Hellwig, T. Kuznicki, S. Sarrach, Heinz P. Huber // Applied Physics A: Materials Science & Processing. – 2011. – Vol. 102, N 1. – P. 173-178.
  14. Kazanskiy, N.L. Research and Education Center of Diffractive Optics / N.L. Kazanskiy // Proceedings of SPIE. – 2012. – Vol. 8410. – 84100R, DOI: 10.1117/12.923233.
  15. Zeze, D.A. Reactive ion etching of quartz and Pyrex for microelectronic application / D.A. Zeze, R.D. Forrest, J.D. Ca­rey, D.C. Cox, I.D. Robertson, B.L. Weiss, S. R. P. Silva // Journal of Applied Physics. – 2002. – Vol. 92, N 7. – P. 3624-3629.
  16. Xuming, W. Etching quartz with inductively coupled plasma etching equipment / W. Xuming, Z. Changhe, X. Peng, D. Enven, R. Huayi, L. Liren // Proceedings of SPIE. – 2003. – Vol. 5183. – P. 192-198.
  17. Volkov, A.V. Dry Etching of Polycrystalline Diamond Films / A.V. Volkov, N.L. Kazansky, G.F. Kostyuk, V.S. Pa­velyev // Optical Memory And Neural Networks (Information Optics). – 2002. – Vol. 11, N 2. – P. 135-137.
  18. Nesterenko, D.V. Creating a curved diffraction gratings for ultraviolet / D.V. Nesterenko, S.D. Poletaev O.Yu. Moiseev, D.M. Yakunenkova, A.V. Volkov, R.V. Skidanov // Bulletin of Samara Scientific Center of the Russian Academy of Sciences. – 2011. – Vol. 13, N 4. – P. 66-71. – (In Russian).
  19. Golub, M.A. Computational experiment with plane optical elements / M.A. Golub, N.L. Kazanskii, I.N. Sisakyan, V.A. Soifer // Optoelectronics, Instrumentation and Data Processing. –1988. – N 1. – P. 78-89.
  20. Kazanskiy, N.L. The study of the diffraction characteristics of focusators into the ring by computational experiment / N.L. Kazanskiy // Computer Optics. – 1992. – N 10-11. – P. 128-144. – (In Russian).
  21. Kazanskiy, N.L. Diffraction investigation of geometric-optical focusators into segment / N.L. Kazanskiy, V.A. Soi­fer // Optik. – 1994. – Vol. 96, N 4. – P. 158-162.
  22. Doskolovich, L.L. Comparative analysis of different focusators into segment / L.L. Doskolovich, N.L. Kazanskiy, V.A. Soifer // Optics and Laser Technology. – 1995. – Vol. 27, N 4. – P. 207-213.
  23. Kazanskiy, N.L. Synthesis of nanoporous structures in metallic materials under laser action / N.L. Kazanskiy, S.P. Murzin, Ye.L. Osetrov, V.I. Tregub // Optics and Lasers in Engineering. – 2011. – Vol. 49, N 11. – P. 1264-1267. DOI: 10.1016/j.optlaseng.2011.07.001.
  24. Volkov, A.V. A Method for the Diffractive Microrelief Forming Using the Layered Photoresist Growth / A.V. Volkov, N.L. Kazanskiy, O.Yu. Moiseev, V.A. Soifer // Optics and Lasers in Engineering. – 1998. – Vol. 29, N 4-5. – P. 281-288.
  25. Abul'khanov, S.R. Manufacture of diffractive optical elements by cutting on numerically controlled machine tools / S.R. Abul'khanov, N.L. Kazanskii, L.L. Doskolovich, O.Y. Ka­zakova // Russian Engineering Research. – 2011. – Vol. 31, N 12. – P. 1268-1272.
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