Creation of doe to form the calibration dot patterns inside the optical systems
S.B. Odinokov, G.R. Sagatelyan, M.S. Kovalyov, A.B. Solomashenko, E.A. Drozdova

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Full text of article: Russian language.

DOI: 10.18287/0134-2452-2013-37-3-341-351

Pages: 341-351.

Abstract:
The possibility of formation of the image in the form of five cross-located points by means of diffraction optical elements (DOE), containing five phase diffraction gratings with rectangular profile, which are working in the second order of diffraction at tilted incidence of the light, occupying total not more than 1% of the area of the DOE. The possibilities of manufacturing a DOE using the “Caroline 15 PE” plasma-chemical etching (PCE) machine are considered. It is established, that on the up to 1,4 mm deepness of surface micro-relief on optical glass and tilted incidence of light, the diffraction efficiency of DOE up to 0,3 – 0,35 on the second order of diffraction is achieved.

Key words:
optical glass, binary micro-relief, tilted incidence of light, deepness of grooves, phase diffraction gratings, plasma-chemical etching, diffraction efficiency

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