Comparative modeling of amplitude and phase zone plates
E.S. Kozlova, V.V. Kotlyar, A.G. Nalimov

 

Image Processing Systems Institute, Russian Academy of Sciences, Samara, Russia,
Samara State Aerospace University, Samara, Russia

Full text of article: Russian language.

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Abstract:
In this paper using FDTD-method, we conduct a comparative modeling of a sharp focus of the laser light by using binary-phase and binary-amplitude Fresnel zone plates, with the latter being fabricated as thin metal films of 20-30-nm thickness. Subwavelength local maximums are found near the rings of the silver zone plates, with their intensity being comparable with the intensity in the focus. They can be explained by the excitation of surface plasmons.

Keywords:
amplitude zone plate, phase zone plate, frequency dispersion, sharp focus, FDTD method.

Citation:
Kozlova ES, Kotlyar VV, Nalimov AG. Comparative modeling of amplitude and phase zone plates. Computer Optics 2015; 39(5): 687-93. DOI: 10.18287/0134-2452-2015-39-5-687-693.

References:

  1. Ojeda-Castaneda J, Gomez-Reino CC. Selected Papers on Zone Plates. SPIE Milestone Series 1996; MS198.
  2. Fu Y, Zhou W, Lim L, Du C, Luo X. Plasmonic microzone plate: superfocusing at visible regime. Appl Phys Lett 2007; 91: 061124.
  3. Mote R, Yu S, Ng B, Zhou W, Lau S. Near-field focusing properties of zone plates in visible regime new insight. Opt Express 2008; 16(13): 9554-64.
  4. Kim H, Ko H, Cheng M. High efficient optical focusing of a zone plate composed of metal/dielectric multilayer. Opt Express 2009; 17(5): 3078-83.
  5. Carretero L, Perez-Molina M, Blaya S, Acebal P, Fimia A, Mardrigal R, Murciano A. Near-field electromagnetic analysis of perfect black Fresnel zone plates using radial polarization. Journal of Lightwave Technology 2011; 29(17): 2585-91.
  6. Carretero L, Perez-Molina M, Gonzalez P, Blaya S, Fimia A, Mardrigal R, Murciano A. Vectorial diffraction analysis of near-field focusing of perfect black Fresnel zone plates under various polarization states. Journal of Lightwave Technology 2011; 29(6): 822-9.
  7. Zhang Y, An H, Zhang D, Cui G, Ruan X. Diffraction theory of high numerical aperture subwavelength circular binary phase Fresnel zone plate. Opt Express 2014; 22(22): 27425-36.
  8. Zhang Y, Zheng C, Zhuang Y. Effect of the shadowing in high-numerical-aperture binary phase Fresnel zone plate. Opt Commun 2014; 317: 88-92.
  9. Stafeev SS, Kotlyar VV. Comparative Modeling TWO Methods of Sharp Focusing with Zone Plate Using. Computer Optics 2011; 35(3): 305-10.
  10. Stafeev SS, O'Faolain L, Shanina MI, Kotlyar VV, Soifer VA. Subwavelength Focusing using Fresnel Zone Plate with Focal Length of 532 nm. Computer Optics 2011; 35(4): 460-1.
  11. Stafeev SS, Kotlyar, VV, O'Faolain L. Subwavelength focusing of laser light by microoptics. J Mod Opt 2013; 60(13): 1050-9.
  12. Stafeev SS, O'Faolain L, Shanina MI, Nalimov AG, Kotlyar VV Sharp Focusing of a Mixture of Radially and Linearly Polarized Beams Using Binary Microlens. Computer Optics 2014; 38(4): 606-13.
  13. Stafeev SS, O'Faolain L, Kotlyar VV, Nalimov AG. Tight focus of light using micropolarizer and microlens. Appl Opt 2015; 54(14): 4388-94.
  14. Couairon A, Sudrie L, Franco M, Prade B,. Mysyrowicz A. Filamentation and damage in fused silica induced by tightly focused femtosecond laser pulses Phys Rev B 2005; 71(12): 125435-41.
  15. Kotlyar VV, Stafeev SS, Lin Y, O'Faolain L, Kovalev AA. Analysis of the shape of a subwavelength focal spot for the linearly polarized light. Appl Opt 2013; 52 (3): 330-9.
  16. Vial A, Laroche T, Dridi M, Le Cunff L. A new model of dispersion for metals leading to a more accurate modeling of plasmonic structures using the FDTD method. Applied Physics A 2011; 103(3): 849-53.
  17. Barnard ES, Coenen T, Vesseur EJR, Polman A, Brongersma ML. Imaging the hidden modes of ultrathin plasmonic strip untennas by cathodoluminescence. Nano Lett 2011; 11: 4265-9.

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