Thin metalens with high numerical aperture
V.V. Kotlyar, A.G. Nalimov, S.S. Stafeev, L. O'Faolain, M.V. Kotlyar

 

Image Processing Systems Institute оf RAS, – Branch of the FSRC “Crystallography and Photonics” RAS, Samara, Russia,
Samara National Research University, Samara, Russia,
SUPA, School of Physics and Astronomy of the University of St. Andrews, Scotlan

Full text of article: Russian language.

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Abstract:
We designed, numerically simulated, fabricated and characterized a thin metalens in an amorphous silicon film. The lens has a diameter of 30 µm, a 633-nm focal length equal to the incident wavelength, a 220-nm period of the subwavelength features, and a 110-nm relief depth. The lens simultaneously controls the phase and polarization of the incident laser light, transforming linear polarization into the radial one and generating a sharp focus. The metalens was fabricated using electron lithography and reactive ion etching. The focal spot obtained from an incident linearly polarized Gaussian beam of wavelength λ measured 0.49λ and 0.55λ on the x- and y-axes. This is a record-breaking focal spot ever obtained using metalenses. Experimental results agree well with the numerically simulated focal spot size of  0.46λ and 0.52λ.

Keywords:
binary optics, meta surface, polarization, focus, near field microscopy.

Citation:
Kotlyar VV, Nalimov AG, Stafeev SS, O'Faolain L, Kotlyar MV. Thin metalens with high numerical aperture. Computer Optics 2017; 41 (1): 5-12. DOI: 10.18287/2412-6179-2017-41-1-5-12.

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