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A method for the diffractive microrelief formation using the layered photoresist growth
A.V. Volkov, N.L. Kazansky, O.Y. Moiseev, V.A. Soifer

 PDF, 419 kB

Pages: 12-14.

Full text of article: Russian language.

Abstract:
The prospects of diffraction optics and its extensive functionality [1-3] require the development of methods of high-quality diffractive microrelief formation. To manufacture the microrelief of diffractive optical elements (DOE), the methods of microelectronic technology are used widely [4–7]. Photolithography occupies a special place among these methods, it allows to design a stepped relief that approximates a given surface shape at each point with a piecewise continuous function [1, 8] .

Citation:
Volkov AV, Kazansky NL, Moiseev OY, Soifer VA. A method for the diffractive microrelief formation using the layered photoresist growth. Computer Optics 1996; 16: 12-14.

References:
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