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Dry etching of polycrystalline diamond films

A.V. Volkov1,2, N.L. Kazanskiy1,2, G.F. Kostyuk2, V.S. Pavelyev1,2

1 IPSI RAS – Branch of the FSRC "Crystallography and Photonics" RAS,
443001, Samara, Russia, Molodogvardeyskaya 151,
2 Samara National Research University, 443086, Samara, Russia, Moskovskoye Shosse 34

 PDF, 220 kB

Pages: 4-9.

Full text of article: Russian language.

Abstract:
The industrial application of high-power CO2 lasers determines the importance of creating power transmitting diffractive optical elements (DOEs) for the far-IR range. Recent advances in the field of gas-phase synthesis allow to produce polycrystalline diamond films with optical and thermophysical properties close to those of single crystals. This article demonstrates the possibility of forming a diffraction microrelief on diamond films by dry etching. It describes the technological scheme for producing a microrelief by ion-chemical etching of a diamond substrate. The measurement results of the produced microrelief confirm the promising nature of the proposed approach.

Keywords:
diamond film, diffractive optical element, DOE, far-IR range, gas-phase synthesis, thermophysical properties, single crystal, dry etching, ion-chemical etching.

Citation:
Volkov AV, Kazanskiy NL, Kostyuk GF, Pavelyev VS. Dry etching of polycrystalline diamond films. Computer Optics 2001; 22: 50-52.

References:
  1. Kononenko VV, Konov VI, Pimenov SM, Prokhorov AM, Pavelyev VS, Soifer VA. Diamond diffractive optical elements for high-power CO2 lasers [In Russian]. Sov J Quantum Electron 1999; 26(1): 9-10.
  2. Kononenko VV, Konov VI, Pimenov SM, Prokhorov AM, Pavelyev VS, Soifer VA. CVD diamond transmissive diffractive optics for CO2 lasers. New Diamond and Frontier Carbon Technology, 2000. Vol. 10. P. 97-107.
  3. Volkov AV, Kazanskiy NL, Soifer VA, Usplenyev GV. Technology of DOE fabrication. In Book: Soifer VA, ed. Methods of computer optics [In Russian]. Moscow: "Fizmatlit" Publisher; 2000: 239-310.
  4. Brown DM, Einspruch NG, eds. Plasma processing technology for VLSI. Academic Press; 1984.
  5. Braginsky BS, Kovalev AS, Muratov EA. Characteristics of a HF-discharge plasma in a transverse magnetic field [In Russian]. In Book: Proceedings of the Physics and Technology Institute. Problems of microelectronic technology. Vol 8. Moscow: "Nauka" Publisher; 1994: 29-37.
  6. Kireev VY, Danilin BS, Kuznetsov VI. Plasma chemical and ion chemical etching of microstructures [In Russian]. Vol 36. Moscow: "Radio i Svyaz" Publisher; 1983.
  7. Ivanovsky GF, Petrov VI. Ion-plasma treatment of materials [In Russian]. Moscow: "Sovetskoe Radio" Publisher; 1986.
  8. Danilin BS. Development prospects of vacuum-plasma etching of microstructures [In Russian]. Elektronnaya tekhnika. Ser 3. Microelectronics 1985; 3(115): 93-100.

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