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The study of modes of plasma etching of synthesized polymerizable compositions
A.V. Volkov, O.E. Rybakov, V.S. Soloviev
Image Processing Systems Institute of RAS

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Pages: 94-96.

Full text of article: Russian language.

Abstract:
A microrelief with a continuous profile is required for the effective operation of diffractive optical elements. Such microrelief can be obtained by using photosensitive polymers, such as liquid photopolymerizable compositions (LPPC), photoresist. For the practical use of diffractive elements obtained using photosensitive polymers, it is necessary to transfer the relief from the polymer to a solid substrate [1]. For example, into glass, if the phase element is intended for the operation at high radiation density, or into silicon, if the element is intended to be reflective, or its matrix is intended for mass copying of any elements using photoplastics. In the latter case, the relief formed in the solid substrate is opposite to the required relief. Unlike binary diffractive elements, the elements with a continuous profile cannot be obtained by liquid etching of a solid substrate (glass, silicon) through a polymer mask, since the polymer mask in a liquid etchant is much more resistant to destruction than the substrate. Another technological aspect: if the polymer is still destroyed in the liquid etchant, then this process cannot be controlled technologically and runs catastrophically in most cases. In addition, liquid etching is isotropic, which is an additional reason that excludes accurate transfer of the relief to the substrate. With “dry” etching, the rate of polymer destruction is controllable and comparable to the rate of etching of a solid substrate. This allows to transfer microrelief into a solid matrix with a controlled transfer coefficient. This paper is devoted to the study of the technological feasibility of implementing such a process.

Citation:
Volkov AV, Rybakov OE, Soloviev VS. The study of modes of plasma etching of synthesized polymerizable compositions. Computer Optics 1997; 17: 94-96.

References:
  1. Soloviev VS, Boiko YB. Fabricating elements of computer optics in liquid photopolymerizable compositions. Computer Optics 1990; 8: 74-76.
  2. Kireev VY, Danilin BS, Kuznetsov VI. Plasma chemical and ion chemical etching of microstructures. Moscow: Radio i Svyaz Publisher; 1983: 128.
  3. Moro W. Microlithography. Part 2. Moscow: Mir Publisher; 1990: 632.
  4. Soloviev VS. The study of the behavior of a liquid photopolymer layer during relief formation. Computer Optics; 1992; 10-11: 145-149.

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