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Creation and study of binary focusing devices for a high-power ND-YAG laser

A.V. Volkov, L.L. Doskolovich, N.L. Kazanskiy, G.V. Uspleniev, A. Zanelli1

Image Processing Systems Institute of RAS

1Fiat Research Center, Italy

 PDF, 627 kB

Pages: 84-89.

Full text of article: Russian language.

Abstract:
The paper considers the problem of design and investigation of diffractive optical elements (DOEs) aimed at transforming a laser beam into a spot of a complex geometric shape [1]. This means that the geometric shape of the spot differs from the point. Such a configuration of the focal region can be achieved by using complex optical schemes or the special-purpose DOEs - laser focusators [1, 2]. Each required focus spot should have a strictly defined intensity distribution along the focus line or within the focus area, i.e. we can talk about static control of laser radiation using focusators.

Citation:
Volkov AV, Doskolovich LL, Kazanskiy NL, Uspleniev GV, Zanelly A. Creation and study of binary focusing devices for a high-power ND-YAG laser. Computer Optics 2000; 20: 84 - 89.

References:

  1. Methods of computer optics edited by V.A. Soifer, Moscow: Fizmatlit; 2000: 688.
  2. Golub M.A., Sisakian I.N., Soifer V.A. Infra-red radiation focusators // Optics and Lasers in Engineering. - 1991. - Vol.15, № 5. - P.297-309.
  3. Volkov AV, Kazanskiy NL, Usplenyev GV. Production and investigational study of focusators into a ring and two points. Computer Optics 1999; 19: 132-136.
  4. Volkov AV, Kazanskiy NL, Rybakov OE. Investigation of the technology of plasma-chemical etching for producing multilevel diffractive optical elements. Computer Optics 1998; 18: 127-130.
  5. Doskolovich LL, Kazanskiy NL, Soifer VA. Calculation of two-order focusators. Avtometriya; 1993; 1: 58-63.
  6. Koronkevich VP, Korolkov VP, Poleshchuk AG, Kharisov AA, Cherkashin VV. Accuracy of fabrication of diffractive optical elements by means of laser writing systems with circular scanning. Computer optics. 1997; 17: 63-74.
  7. Babin S., Danilov V. Photomask fabrication of focusing diffractive optical elements using electron beam lithography // Proceedings SPIE. – 1995. – Vol. 2426 “9th Meeting on Optical Engineering in Israel”, p. 215-227.

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