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Methods of fabricating the surface profile of diffractive optical elements
A.G. Poleshchuk

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Pages: 54-61.

Full text of article: Russian language.

Abstract:
The paper reviews the results of a study of the photolithographic method for manufacturing highly efficient diffractive optical elements (DOEs) based on the use of only one photomask with two gradations of transmission. The halftone image screening technique is used for the binarization of the continuous transmission function of the diffractive element, and incoherent spatial filtering in combination with the usual photolithographic process is used for the exposure of a photosensitive medium. The dependence of the diffraction efficiency of DOEs on the parameters of the photomask, binarization methods, and manufacturing errors is analyzed. The characteristics of the proposed method are compared with the well-known multilevel method. Peculiarities of manufacturing a DOE with a continuous phase profile based on projection, contact, and X-ray lithography are considered. The results of an experimental study are presented. The possibility of manufacturing a DOE with a diffraction efficiency of more than 80% using only one photomask is shown.

Citation:
Poleshchuk AG. Methods of fabricating the surface profile of diffractive optical elements. Computer Optics 1996; 16: 54-61.

References:
  1. Feldman MR, Guest CC. Computer generated holographic optical elements for optical interconnection of very large-scale integrated circuits. Appl. Opt.; 1987; 26(20): 4377.
  2. Streibl N. Application of diffractive optical elements in optoelectronic interconnection systems. SPIE Proceedings; 1991; 1574.
  3. Swanson GJ, Veldkamp WB. Diffractive optical elements for use in infrared system. Opt. Eng.; 1989; 28(6): 605.
  4. Gale MT, Rossi M, Pedersen J, Schutz H. Fabrication of continuous-relief micro-optical elements by direct laser writing in photoresist. Optical Engineering; 1994; 33(11): 3556-3566.
  5. Gotchiyaev VZ, Korolkov VP, Sokolov AP, Chernukhin VP. High Rezolution Optical Recording on a-Si Films. J. Non-Crystal. Solids; 1991; 137-138: 1297-1300.
  6. Poleshchuk AG. Fabrication of high efficiency diffractive optical elements using halftone and photorastered technologies. Avtometriya; 1991; 6.
  7. Bryndahl O. Formation of blazed grating. J.Opt.Soc.Am.; 1970; 60: 140-145.
  8. Poleshchuk AG. Fabrication of high efficiency elements for diffractive and integrated optics by photorastered technology. The 5- th National Conference on Optics and Laser Engineering. Bulgaria, Varna: 1989; 7-8.
  9. Poleshchuk AG. Fabrication of phase structures with continuous and multilevel profiles for diffractive optics. SPIE Proceedings 1991,1574.
  10. Oppliger Y, Sixt P, Stauffer J, Mayor J, Regnault P, Voirin G. One -step 3D shaping using a grey-tone mask for optical and microelectronics application. Microelectronics Engineering; 1994; 23; 449-454.
  11. O'Shea DC, Thompson PL, Rockward WS. Grayscale masks for diffractive optics: Spatial filtered halftone screens. OSA Technical Digest Series: Diffractive Optics; Washington, DC: Optical Society of America; 1994; 11: 119-121.
  12. Moreau M. Semiconductor lithography. Principles, Practices and Materials. New York and London: Plenum Press; 1988.
  13. Bastians MJ. A generalised sampling theorem with application to computer - generated transparencies. J.Opt.Soc.Am.; 1978; 68: 1658.
  14. Kulipanov GN, Makarov OA, Mezentseva LA, Nazmov VP, Pindyurin VF, Cherkashin VV, Koronkevich VP, Poleshchuk AG, Sinyukov MP, Cerrina F, Chen Z, Krasnoperova AA. Diffraction optical elements with deep profile manufactured by X-ray lithography. Proc. of the first conference on High Aspect Ratio Microstructure Technology (HARMST’95); Germany, Karlsruhe: 1995 (to be published in a special issue of Microsystems Technologies (Springer).
  15. Koronkevich VP, Poleshchuk AG et.al. Fabrication of kinoform optical elements. Optik; 1984; 67(3): 259-266.
  16. Dontsova VV, Klevtsov YA, Koronkevich VP., Poleshchuk AG. Objective microlenses with diffraction corrector for disk memory; 1994; 1: 3-10.
  17. Poleshchuk AG, Kharisov AA. The particular features of application of diffraction lenses in light concentrators of solar cells. Avtometriya; 1994; 3: 106-109 .

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