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Study of processes of photoresist deposition and etching to improve the accuracy of the wide DOE microrelief formation
A.V. Volkov, N.L. Kazanskiy, O.Y. Moiseev
Image Processing Systems Institute of RAS

 PDF, 446 kB

Pages: 143-146.

Full text of article: Russian language.

Abstract:
The methods of microelectronic technology are widely used when producing microrelief of diffractive optical elements (DOEs), which allows to form a stepped relief approximating the required shape of the optical element surface.

Citation:
Volkov AV, Kazanskiy NL, Moiseev OY. Study of processes of photoresist deposition and etching to improve the accuracy of the wide DOE microrelief formation. Computer Optics 1999; 19: 143 - 146

References:
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