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Checking the refractive index change in liquid photopolymerizable compositions

A.V. Volkov, N.L. Kazanskiy, V.S. Soloviev

Image Processing Systems Institute of RAS, Samara

 PDF, 496 kB

Pages: 117-120

Full text of article: Russian language.

Abstract:
A method is available for generating the structures with a continuous microrelief profile on the diffractive optical elements based on liquid photopolymerizable compositions [1, 2]. To obtain the maximum microrelief height at a given photomask contrast, it is necessary to provide such an energy exposure, at which the weight ratio of the polymer formed upon exposure to the initial oligomer (conversion) would differ as much as possible in the exposed and non-exposed areas [3]. Since the polymer refractive index is higher than the refractive index of its own oligomer [4], the refractive index will be higher at the areas where the conversion level is higher. Thus, by recording the difference between the refractive indices in the exposed and non-exposed areas, it is possible to predetermine the height of the microrelief produced by the dark growth.

Citation:
Volkov AV, Kazanskiy NL, Soloviev VS. Checking the refractive index change in liquid photopolymerizable compositions. Computer Optics 2001; 21: 117 - 120.

References:
  1. Solovjev VS, Boiko YB. Fabricating elements of computer optics in liquid photopolymerizable compositions. Computer Optics 1990; 8: 74-76.
  2. Solovjev VS. Investigating the behavior of a layer of liquid photopolymerizable composition during relief formation. Computer Optics 1992; 10-11: 145-149.
  3. Volkov AV, Kazanskiy NL, Solovjev VS. Structure and dynamics of molecular systems. Proc VI All-Russian Conf "Structure and dynamics of molecular systems" 1999: 83-86.
  4. Boiko YB, Granchak VM, Dilung I, Solovjev VS, Soifer VA. Relief holograms recording on liquid photopolymerizabel layers. Proc SPIE 1990; 1238: 253-257.
  5. Born M, Wolf E. Principles of optics: Electromagnetic theory of propagation, interference and diffraction of light. 4th ed. New York: Pergamon Press; 1970.

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