(49-3) 06 * << * >> * Russian * English * Content * All Issues
Methodology for determining temperature dependences of the diffraction efficiency of two-layer two-relief microstructures in the framework of a rigorous coupled-wave analysis
A.I. Antonov 1, G.I. Greisukh 1
1 Penza State University of Architecture and Construction,
Germana Titova Str. 28, Penza, 440028, Russia
PDF, 1124 kB
DOI: 10.18287/2412-6179-CO-1575
Pages: 391-398.
Full text of article: Russian language.
Abstract:
Aiming to calculate the diffraction efficiency of diffractive optical elements with a two-layer microstructure and two internal sawtooth reliefs within the framework of the rigorous electromagnetic theory of diffraction, we propose an approach that involves calculating the efficiency of the element as a whole through the efficiency of each zone of the microstructure separately. This approach is a basis for a DE calculation method, which takes into account the normalized area of each zone of a two-layer microstructure, the temperature dependences of the depths of both reliefs and their refractive indices, as well as the local mutual displacement of the microstructure layers due to a difference in the thermal expansion coefficients of their materials. We present a mathematical apparatus of the proposed technique that minimizes the computational complexity and demonstrates its effectiveness by the example of calculating the diffraction efficiency of the diffractive element of an ultra-high-aperture refractive-diffraction athermal dual-band infrared lens. We show that due to variations in the operating temperature (from –40°C to + 60°C), the diffraction efficiency drops by no more than 7% over the entire operating spectral range (3.5 – 5.2 μm; 7.5 – 11.4 μm) with permissible angles of light incidence on the microstucture ranging from –14° to +14°.
Keywords:
diffractive optical element, two-layer microstructure with two internal sawtooth reliefs, diffraction efficiency, rigorous coupled-wave analysis, Fourier coefficients, temperature expansion, thermo-optical constants.
Citation:
Antonov AI, Greisukh GI. Methodology for determining temperature dependences of the diffraction efficiency of two-layer two-relief microstructures in the framework of a rigorous coupled-wave analysis. Computer Optics 2025; 49(3): 391-398. DOI: 10.18287/2412-6179-CO-1575.
Acknowledgements:
The study was financially supported by a grant from the Russian Science Foundation under project no. 20-19-00081.
References:
- Tissot JL, Trouilleau C, Fieque B, Crastes A, Legras O. Uncooled microbolometer detector: Recent developments at Ulis. Opto-Electron Rev 2006; 14(1): 25-32. DOI: 10.2478/s11772-006-0004-2.
- Keskin S, Akin T. The first fabricated dual-band uncooled infrared microbolometer detector with a tunable micro-mirror structure. Proc SPIE 2012; 8353: 83531C. DOI: 10.1117/12.964551.
- Smith EM, Panjwani D, Ginn J, et al. Dual band sensitivity enhancements of a VOx microbolometer array using a patterned gold black absorber. Appl Opt 2016; 55(8): 2071-2078. DOI: 10.1364/AO.55.002071.
- GOST Р 58565-2019 (ISO 15902:2004). Optics and photonics. Diffractive optics. Vocabulary, MOD [In Russian]. Moscow: "Standardinform" Publisher; 2019.
- Greisukh GI, Levin IA, Ezhov EG. Design of ultra-high-aperture dual-range athermal infrared objectives. Photonics 2022; 9(10): 742. DOI: 10.3390/photonics9100742.
- Greysukh GI, Danilov VA, Ezhov EG, Antonov AI, Usievich BA. Diffractive elements in optical systems of middle and double IR range [In Russian]. Fotonika 2020; 14(2): 160-169. DOI: 10.22184/1993-7296.FRos.2020.14.2.160.169.
- Greisukh GI, Ezhov EG, Kazin SV, Sidyakina ZA, Stepanov SA. Visual assessment of the influence of adverse diffraction orders on the quality of image formed by the refractive-diffractive optical system. Computer Optics 2014; 38(3): 418-424. DOI: 10.18287/0134-2452-2014-38-3-418-424.
- Moharam MG, Gaylord TK. Diffraction analysis of dielectric surface-relief gratings. J Opt Soc Am 1982; 72(10): 1385-1392. DOI: 10.1364/josa.72.001385.
- Moharam MG, Grann EB, Pommet DA, Gaylord TK. Formulation for stable and efficient implementation of the rigorous coupled-wave analysis of binary gratings. J Opt Soc Am 1995; 12(5): 1068-1076. DOI: 10.1364/josaa.12.001068.
- Li L. Formulation and comparison of two recursive matrix algorithms for modeling layered diffraction gratings. J Opt Soc Am 1996; 13(6): 1024-1035. DOI: 10.1364/josaa.13.001024.
- Antonov AI, Greisukh GI. Approach for finding amplitudes of the transmitted diffraction orders in the framework of a rigorous coupled-wave analysis and its application in the study of three-layer sawtooth microstructures. Proc SPIE 2020; 11551: 115511C. DOI: 10.1117/12.2572287.
- Antonov AI, Greisukh GI, Ezhov EG, Techniques for speeding up algorithms for implementing rigorous coupled-wave analysis. Proc SPIE 2024; 12972: 129720H. DOI: 10.1117/12.3021997.
- Moharam MG, Grann EB, Pommet DA, Gaylord TK. Stable implementation of the rigorous coupled-wave analysis for surface-relief gratings: enhanced transmittance matrix approach. J Opt Soc Am 1995; 12(5): 1077-1086. DOI: 10.1364/josaa.12.001077.
- Lalanne P, Silberstein E. Fourier-modal methods applied to waveguide computational problems. Opt Lett 2000; 25(15): 1092-1094. DOI: 10.1364/ol.25.001092.
- ZEMAX. 2023. Sourse: <https://www.ansys.com/products/optics/ansys-zemax-opticstudio>.
- Greisukh GI, Antonov AI, Ezhov EG, Danilov VA, Usievich BA. Conditions for minimizing the computational complexity of the RCWA calculation of the diffraction efficiency of sawtooth two-layer double-relief microstructures. Photonics 2023; 10(7): 794. DOI: 10.3390/photonics10070794.
- Greisukh GI, Danilov VA, Stepanov SA, Antonov AI, Usievich BA. Minimization of the total depth of internal saw-tooth reliefs of a two-layer relief-phase diffraction microstructure. Optics and Spectroscopy 2018; 124(1): 98-102. DOI: 10.1134/S0030400X18010071.
© 2009, IPSI RAS
151, Molodogvardeiskaya str., Samara, 443001, Russia; E-mail: journal@computeroptics.ru ; Tel: +7 (846) 242-41-24 (Executive secretary), +7 (846) 332-56-22 (Issuing editor), Fax: +7 (846) 332-56-20