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Application of gray-scale LDW-glass masks for fabrication of high-efficiency DOEs
V.P.Korolkov1, A.I.Malyshev1, V.G.Nikitin1, A.G. Poleshchuk1, A.A. Kharissov1, V.V. Cherkashin1, C. Wu2
1Institute of Automation and Electrometry of the Siberian Branch of the Russian Academy of Sciences (Novosibirsk)
2CANYON MATERIALS Inc., San Diego, CA 92121, USA
PDF, 2009 kB
Pages: 121-126.
Full text of article: Russian language.
Abstract:
The paper describes the results of investigating the behavior of LDW glasses in a wide range of scanning speeds of the writing laser beam. The article considers the peculiarities of production of halftone photomasks on a laser recording system with circular scanning. The authors discuss the results of application of halftone photomasks for fabrication of high-performance diffractive lenses.
Citation:
Korolkov VP, Malyshev AI, Nikitin VG, Poleshchuk AG, Kharissov AA, Cherkashin VV, Wu C. Application of gray-scale LDW-glass masks for fabrication of high-efficiency DOEs. Computer Optics 1998; 18: 121-126.
References:
- Korolkov VP, Chernukhin VP. Optical-recording in amorphous-silicon films with sub-micron resolution [In Russian]. Zhurnal Tekhnicheskoi Fiziki 1989; 59(6): 131-133.
- Gotchiyaev VZ, Korolkov VP, Sokolov АР, Chernukhin VP. High resolution optical recording on a-Si films. J Non Cryst Solids 1991; 137-138(2): 1297-1300.
- Wu C-K. High energy beam sensitive glasses. Pat USA 5285517 of February 8, 1994.
- Däschner W, Long P, Stein R, Wu C, Lee SH. Cost-effective mass fabrication of multilevel diffractive optical elements by use of a single optical exposure with a gray-scale mask on high-energy beam-sensitive glass. Appl Opt 1997; 36(20): 4675-4680.
- Perlo P, Sinesi S, Ripetto M, Uspleniev G. The use of a circle laser writing system for the manufacture of halftone patterns of diffractive optical elements based on DLW glass plates [In Russian]. Computer Optics 1997; 17: 85-90.
- Poleshchuk AG. Fabrication of high efficiency diffractive optical elements using halftone and photorastered technologies [In Russian]. Avtometriya 1991; 3: 66-76.
- Korolkov VP, Koronkevich VP, Malyshev AI, Nikitin VG. New fabrication method for diffractive optical elements with deep phase relief. Proc SPIE 1997; 3010: 180-191.
- Anderson H, Ekberg M, Hård S, Jacobsson S, Larsson M, Nilsson T. Single photomask, multilevel kinoforms in quartz and photoresist: manufacture and evaluation. Appl Opt 1990; 29(28): 4259-4267.
- Janai M, Moser F. Optical recording in amorphous silicon films. J Appl Phys 1982; 53(3): 1385-1386.
- LDW-glass photomask blanks. CMI Product information No 95-08. Source: <http://www.canyonmaterials.com/prop_hebs14.html>.
- Hounde-Walter SN. Gradient index optics and miniature optics. Proc SPIE 1988; 935: 2.
- Salmio R-P, Saarinen J, Turunen J, Tervonen A. Graded-index diffractive elements by thermal ion exchange in glass. Appl Phys Lett 1995; 66(8): 917-919.
- Cherkashin VV, Churin EG, Korol’kov VP, Koronkevich VP, Kharissov AA, Poleshchuk AG, Burge JH. Processing parameters optimization for thermochemical writing of DOEs on chromium films. Proc SPIE 1997; 3010: 168-179.
- Suleski TJ, O’Shea DC. Gray-scale masks for diffractive-optics fabrication: I. Commercial slide imagers. Appl Opt 1995; 34(32): 7507-7517
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