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Investigation of the technology of plasma-chemical etching for producing multilevel diffractive optical elements
A.V. Volkov, N.L.Kazanskiy, O.E.Rybakov
Image Processing Systems Institute of RAS

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Pages: 127-130

Full text of article: Russian language.

Abstract:
Plasma-chemical or “dry” etching allows to make a profile in any material with the precision and surface quality unattainable for conventional liquid etching. This is achieved due to the features of the anisotropic etching mode, high controllability and stability of technological processes during dry etching.It seems expedient to use plasma-chemical etching to form the microrelief of diffractive optical elements (DOE), as the accuracy of producing the diffractive microrelief determines the quality of the optical elements [1]. In this work, we analyze the applicability of the plasma etching unit UTP PDE-125-009 for the production of diffractive optical elements of the mid-IR range on silicon substrates of the KDB-4.5 brand with a diameter of 76 mm [2] .

Citation:
Volkov AV, Kazanskiy NL, Rybakov OE. Investigation of the technology of plasma-chemical etching for producing multilevel diffractive optical elements. Computer Optics 1998; 18: 127-130.

References:
  1. Golub МА, Rybakov OE, Usplenjev GV, Volkov AV, Volotovsky SG. The technology of fabricating focusators of infrared laser radiation. Opt Laser Technol 1995; 27(4): 215-218.
  2. Stem MB, Jay TR. Dry etching for coherent refractive microlens arrays. Opt Eng 1994; 33(11): 3547-3551.
  3. Golub MA, Sisakian IN, Soifer VA. Infra-red radiation focusators. Opt Lasers Eng 1991; 15(5): 297-309.
  4. Doskolovich LL, Kazanskiy NL, Soifer VA. Comparative analysis of different focusators focusing into a segment. Opt Laser Technol 1995: 27(4): 207-213 .

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